JAI KELKAR
** **** **** **** ● S. Burlington, VT 05403
802-***-**** ● *********@*****.***.
SUMMARY
- Chemical engineer with significant R&D and project management experience.
- Track record of success in developing innovative processes which resulted in significant savings (more than $4M); authored 2 patent disclosures describing novel process implementations.
- Strong leadership and communication skills gained through working with multiple vendors and clients on $5M equipment procurement and process development projects.
- Expert-level command of various computer applications (MS Office, MATLAB, Mathematica, Minitab)
EXPERIENCE
UNIVERSITY OF DELAWARE, Newark, DE
Graduate Research Assistant, 2009-2010
- Synthesized novel block copolymer materials as part of a $50k/year research grant from the National Science Foundation; gained proficiency in material characterization, spectroscopy, and separation techniques.
- Completed 26 credits of graduate-level coursework with a focus on statistical thermodynamics, kinetic processes, and transport phenomena.
IBM, Essex Jct., VT
Photomask Development Engineer, 2007-2009
- Designed and implemented a new photomask inspection method which resulted in $4M in savings to the company and reduced inspection time by 5X.
- Developed an innovative photomask repair process to recover masks which otherwise would have been scrapped. Resulted in savings of over $50k/year and increased yield by 15%.
- Authored and published 2 patent disclosures describing novel process implementations.
- Managed the procurement of a $5M laser-based mask repair tool. Performed characterization testing and developed specific repair processes which are currently being used to manufacture >1500 photomasks per year at the company. Conducted training sessions for over 25 engineers and technicians.
- Developed processes for the inspection and repair of photomask defects using electron and laser beam, and AFM-based tools.
MYLAN TECHNOLOGIES, INC., St. Albans, VT
Research and Development intern, Summer 2004
- Took ownership of newly-acquired rheological equipment and developed a tool guide including operating procedures, capabilities, and limitations, which increased productivity by 50%. Conducted training sessions for over 15 scientists and engineers at the company, and presented project details to various levels of management.
EDUCATION
UNIVERSITY OF DELAWARE, Newark, DE, 2009-2010
- Master of Chemical Engineering, expected December 2010.
- GPA: 3.58/4.0; Awarded a full tuition scholarship ($25k/yr.) and stipend ($27k/yr.)
JOHNS HOPKINS UNIVERSITY, Baltimore, MD, 2003-2007
- Bachelor of Science (with Honors), Chemical Engineering, May 2007.
- GPA: 3.55/4.0; Dean’s List, 2005-2007
- Recipient of IBM Watson Scholarship, 2003-2007 ($8000/yr.)
PATENTS/DISCLOSURES
- Kelkar, J.; Lawliss, M.; Thibault, D.; Flanigan, P.; Magg, C. “Method for the Repair of Large Isolated Defects Using a Femtosecond Pulse Laser”, www.IP.com, disclosure no.: IPCOM0001833895D (2009)
- Kelkar, J.; Thibault, D.; Lawliss, M. “Photomask Repair Verification Method Using Image Analysis Software”, www.IP.com, disclosure no.: IPCOM000188020D (2009)
INTERESTS/HOBBIES
- Tennis: captain of high school varsity team (South Burlington, VT); led team to 3 state championships.
- Dance: member of two Indian-themed dance groups in college; competed in 4 national competitions.