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Electrical Engineering Engineer- Optoelectronics

Location:
Albuquerque, NM
Posted:
May 12, 2020

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Resume:

Juan J Faria-Briceno

Postdoctoral fellow at CHTM-University of New Mexico

Highly motivated engineer who can provide support with team work, research, hand -on and theoretical analysis. My area of expertise is Metrology (Optical angular Scatterometry). I have developed and designed an In-line Optical angular Scatterometry System for Roll-2-roll nano-fabrication systems (published patent); Off-line optical angular scatterometry, ellipsometry, SEM, and reflectometers. ******@*****.***

505-***-****

3003 Transport St SE, Apartment

120D, ALBUQUERQUE, United

States

linkedin.com/in/juan-j-faria-

briceno-36670170

SKILLS

In-line/off-line Optical

Angular Scatterometry

Interferometric

Lithography

Optical Metrology

Nano-fluidic SEM

Ellipsometry

Optical and Mechanical

Designing

MATLAB LabView

RCWA

R2R/Nano imprint

Fabrication

LANGUAGES

English

Native or Bilingual Proficiency

Spanish

Native or Bilingual Proficiency

WORK EXPERIENCE

08/2015 – 12/2019

Graduate Research Assistant

Center for High Technology and Materials (CHTM)

Albuquerque

University of New Mexico

Design In-line Metrology Systems for R2R Manufacturing 01/2020 – Present

Postdoctoral Fellow

Center for High Technology and Materials (CHTM)

Albuquerque

University of New Mexico

Commercialize and develop metrology systems for real-time inspection during NIL. Contact: Steven RJ Brueck – *******@***.***

PERSONAL PROJECTS

Liquid Drop Properties on Nanoscale 1D Patterned Structures (08/2015 – 12/2017) Peer-reviewed Paper: J.J. Faria-Briceno, et. al. Scientific Rep. 9, 5723 (2019). Peer-reviewed Paper: Xuemei Wang, Juan J. Faria-Briceno, Tito Busani and S.R.J. Brueck. JVST-B. 37, 051806-1

(2019).

Optical Angular Scatterometry for R2R and Nano-imprint Fabrication (08/2015 – Present) Peer-reviewed Paper: J.J. Faria-Briceno, et. al. JVST-B. 37, 052901-1 (2019). Peer-reviewed Paper: Ruichao Zhu, J.J. Faria- Briceno, Steven R.J. Brueck. AIP. 10, 015140 (2020). Published Patent: Method and System for In-line Optical Scatterometry. Int Pub # WO 2019/217330 A1. Provisional Patent: In-line Angular Multi-point Scatterometry for Nanomanufacturing Systems. EDUCATION

08/2015 – 12/2019

Ph.D. Optoelectronics - Electrical and Computer Engineering University of New Mexico

Albuquerque, NM - GPA: 3.81 Dissertation Distinctions ACHIEVEMENTS/HONORS

2nd Place Nano-manufacturing System for MObile Computing and Mobile Energy Technologies (NASCENT) Mentor of Summer 2017 (08/2017) Departmental Honors - CUM LAUDE ON BSEE UNM (05/2015) Eta Kappa Nu Honor Society for Electrical Engineering (08/2013) ROP/McNair Research Scholar - University of New Mexico (08/2013 – 08/2015) Graduate Research Fellow - El Puente Fellowship (09/2015 – 09/2016) Latino Research Fellowship (01/2016 – 09/2016)

Achievements/Tasks

Achievements/Tasks



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