Uk Huh

Uk Huh

Actively seeking new position – Materials Scientist and Microscopist

Department of Material Science and Engineering, University of Tennessee, Knoxville, TN, 37996, USA Cell: 919-***-**** E-mail: ac012w@r.postjobfree.com LinkedIn: https://www.linkedin.com/in/ukhuh/ PROFESSIONAL SUMMARY

Accomplished materials science and analytical instrument professional with distinguished performance in the nanotechnology industry. Portfolio of achievements includes designing of experiments, fabricating materials, characterizing those with analytical equipment, interpreting analysis results, and driving profit improvements. Contributed to development of new techniques, discovery of nature of materials behavior, and revenue growth for some of the leading technology businesses through a combination of knowledge, expertise, experience, work ethics, team play, and commitment to organizational objective. EDUCATION

Ph.D. University of Tennessee, Knoxville, TN, USA 2014 Material Science and Engineering – GPA 3.9/4.0

Research advisor: Distinguished Scientist and Professor, Dr. David C. Joy Thesis Title: Monte Carlo Modeling of Ion Beam Induced Secondary Electrons M.S. North Carolina State University, Raleigh, USA 2008 Material Science and Engineering

B.S. Yonsei University, Seoul, South Korea 2000

Metallurgical Engineering

WORK EXPERIENCE

FIB/SEM Applications Engineer, Carl Zeiss Microscopy, LLC., Thornwood, NY 2016

• Characterized materials and interpreted analysis results by implementing various forms of characterization techniques using electron microscopes and correlated equipment

• Published external and internal technical analysis reports to make practical recommendations

• Sold GeminiSEM 300 to Sandia National Laboratory valued at $ 500,000 with the reports Post Doctoral Scholar, University of Tennessee, Knoxville, TN, USA 2014 – 2015

• Developed the advanced Monte Carlo simulation software to model electron/helium beam induced materials behavior and to enhance measurement capability by quantifying imaging performance of scanning electron/helium ion microscopes, which is essential in the electron beam inspection and metrology solution (Critical Dimension SEM applications) in the semiconductor business

• Served as practicum instructor and trainer in SEM techniques for various applications

• Served as mentor and advisor to Gary Phillips, PhD candidate, Entomology and Nematology – SEM imaging of kleptoparasitic nematodes of Class Diplopoda PECVD/Reliability Engineer, Samsung Electronics, Semiconductor Business, S. Korea 2000 – 2004

• Performed Six Sigma based quality control of fabrication processes for thin film transistor liquid crystal display (TFT-LCD) with profound knowledge of device physics and fabrication process

• Analyzed and solved technical issues with various electro-optical components

• Executed failure analysis on TFT-LCD to investigate root cause of the failure and determine defect characteristics, which resulted in enhanced production yields and maximum profits

• Maintained consistent preventative maintenance program on plasma enhanced chemical vapor deposition (PECVD) equipment for thin film deposition process RESEARCH HIGHLIGHTS

Correlative Microscopy Solution

• Connected light and electron microscopes for easy sample transfer, fast coordinate recovery, and powerful image correlation

Developed new techniques for electron microscopy and electron-beam microanalysis

• Conceptualized, devised and published Monte Carlo simulation software (written in C++ programing language) to model electron and helium ion beam interactions (charged particle optical system and physics) with matters for nano-metrology (CD SEM applications) with semiconductors Effect of boron implantation damage on the structure of Al2O3

• Examined ion irradiation-induced damage of materials utilizing ion beam analysis techniques – Rutherford Backscattering Spectrometry, ion channeling, elastic recoil detection, optical spectrometry analysis, and SRIM (simulation software) at Pacific Northwest National Laboratory and Los Alamos National Laboratory

• Observed Z-contrast images of near surface damaged layers and identified chemical composition of unknown nature of materials with EELS measurements Enhanced absorption in ultra-thin Si by NiSi2 nanoparticles

• Established and clarified the size, shape, average interparticle spacing and composition of nickel silicide utilizing BF, HAADF and EELS techniques

Aminosilane for hydroxyapatite-gelatin nanocomposites

• Monitored and examined the configuration and structure of gelatin nanocomposites using TEM

• Investigated and researched the surface topography of nanostructures of hydroxyapatite nanocrystals utilizing AFM

• Identified, classified and detected the crystalline structure of hydroxyapatite nanocrystals in aminosilica matrix utilizing X-ray diffraction

Silver nanoparticles in aminosilica

• Characterized the size, shape, phase, and average density of silver nanoparticle distribution through high resolution TEM and electron beam diffraction images

• Clarified and established the structure of particles embedded within aminosilica colloids was crystalline silver through the incorporation of XRD techniques SKILLS AND TECHNIQUES

TEM – Philips CM12, Zeiss Libra 200 MC, Hitachi HF3300 STEM – Nion HB501UX/HB601UX with 3rd order correctors EELS – Gatan Enfina Spectrometer

FIB/SEM – Hitachi NB5000, Zeiss AURIGA, Zeiss CrossBeam 540 with Oxford EDS SEM – Zeiss GeminiSEM 500, Hitachi TM3030, Zeiss Sigma 500, Zeiss MERLIN EDX/EDS – OXFORD AZtecEnergy EDS, BRUKER QUANTAX EDS Light Microscope – Zeiss Axio Observer, Zeiss Axio Imager 2, Zeiss Axio Examiner, Zeiss Smartzoom 5 AFM – CaliberTM

XRD – Philips PW1820

PECVD – AKT®-PECVD System for TFT-LCD

DISTINCTIONS AND AWARDS

Presidential Scholar Award, Microscopy & Microanalysis 2014 Meeting, Hartford, CT 2014 Best Poster Award, KSEA 2013 Meeting, Rutherford, NJ 2013 SELECTED PEER-REVIEWED PUBLICATIONS

U. Huh, W. Cho, and D. C. Joy, "Monte Carlo modeling of ion beam induced secondary electrons," Ultramicroscopy, vol. 168, pp. 28-33, September 2016 V. Iberi, U. Huh, Y. Wu, P. Rack, A. Rondinone, and D. C. Joy, “Scanning Helium Ion Microscopy-Induced Secondary Electron Yields of Composite Materials,” Microscopy and Microanalysis, S3, pp. 1691-1692, August 2015

U. Huh, R. Ramachandra, W. Cho, and D. C. Joy, “Monte Carlo modeling of ion beam induced secondary electrons," Microscopy and Microanalysis, S3, pp. 302-303, August 2014 U. Huh, R. Ramachandra, W. Cho, and D. C. Joy, “Study of ion beam generation of secondary electrons,” UKC 2013, August 2013

U. Huh, Y. Zhang, E. Alves, V. Shutthanandan, C. Muntele, and C. J. McHargue, “Effect of boron implantation on the structure of sapphire,” proceeding of the 16th International Conference on Radiation Effects in Insulators, August 2011

U. Huh and C. J. McHargue, “Defect Structures in Iron Implanted Sapphire,” the Oak Ridge Chapter of ASM, November 2010

T.-J. M. Luo, C.-C. Ko, C.-K. Chiu, J. Llyod, and U. Huh, "Aminosilane as an effective binder for hydroxyapatite-gelatin nanocomposites," Journal of Sol-Gel Science and Technology, vol. 53, pp. 459-465, Feb 2010

Y.-J. Choi, U. Huh, and T.-J. M. Luo, "Spontaneous formation of silver nanoparticles in aminosilica," Journal of Sol-Gel Science and Technology, vol. 51, pp. 124-132, Jul 2009 REFERENCES

David C. Joy Claudia J. Rawn Larry Kolodziejski

Distinguished Professor Associate Professor Sr. Applications Engineer University of Tennessee University of Tennessee Carl Zeiss Microscopy ac012w@r.postjobfree.com ac012w@r.postjobfree.com ac012w@r.postjobfree.com

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