Software Engineer System
Resume:
Allan Sagle
Berkeley Ca, **702
Phone: 510-***-****
e-mail: *****@*******.***
fax : 510-***-****
Education
**** **.* ** ******* from the University of California at Davis
Thesis: The Absolute Measurement of Neutron Polarization in the 5 Nucleon
Reaction
Post doctoral research at the Lawrence Berkeley Laboratory 1974 - 1982
Experiments on the medium energy accelerator, the Bevetron
Work Experience
Berkeley Engineering and Research Nov 2006 present
Designed, built and tested prototype non-stick electrosurgical forceps. Designed
an IR system to detect the spatial and intensity distribution of carbon monoxide
from a flame for oil refineries
4-Dimaging May 2006 2007
Calibrated and tested 3-dimensional imaging scanners that use structured light
techniques. Updated a patent to include single shot techniques that eliminates
blurring due to motion
ETEC: 1982- 2006
2004 Performed experiments to isolate the dose error due to shot noise by measuring
shot noise dose and CD uniformity on a medium resolution machine at ETEC and
a high resolution machine at LBNL. These latter experiments showed that shot
noise could be reduced to manageable levels by using a mask writer with a small
beam blur. Incorporated shot noise effects in the error budget for the next
generation e-beam mask-maker
2002 Started working on the raster shaped beam product
Constructed an error budget
Tested the error budget. Correlated beam on edge noise with lithography CD
uniformity by injecting 60 hz and white noise into the tool
Developed a technique to measure the isofocal dose using overlay shifts
1997 Performed system engineering for the raster multi-beam project which included
the development of
Error budgets
Throughput models
Writing strategies
Study of system tradeoffs
1987 Software supervisor for the vector shaped beam tool called AEBLE
Up to 8 engineers
Developed software for calibrations, writing, registration, and metrology
Shipped releases to 12 customers
Implemented engineering change orders
1982 Control software engineer. I developed software for:
electron column setup
and shape calibration
Publications:
Exploring the fundamental limit of CD control: a model for shot noise in
lithography
Ming L. Yu, Allan Sagle, and Benny Buller
Proceedings of SPIE -- Volume 5751, May 2005, pp. 687-698
Exploring the fundamental limit of CD control: a measurement of shot noise
induced CDU in e-beam lithography
Ming L. Yu, Allan Sagle, and Benny Buller
Proceedings of SPIE -- Volume 5835, June 2005, pp. 105-114
Exploring the fundamental limit of CD control: shot noise and CD uniformity
improvement through resist thickness
Ming L. Yu, Allan Sagle, and Benny Buller
Proceedings of SPIE -- Volume 5853, June 2005, pp. 42-51
Raster Shaped Beam Pattern Generation for 70 nm Photomask Production
Thomas H. Newman et al.
Proc. SPIE Int. Soc. Opt. Eng. 4889, 168 (2002)
Prototype raster multibeam lithography tool
S. T. Coyle, D. Holmgren, X. Chen, T. Thomas, A. Sagle, J. Maldonado, B.
Shamoun, P. Allen, and M. Gesley
J. Vac. Sci. Technol. B 20, 2657 (2002)
Progress toward a high-brightness photoemission source for multiple-electron
beam lithography
S. T. Coyle, A. Fernandez, G. Janaway, A. Sagle, and M. Mankos
J. Vac. Sci. Technol. B 19, 2581 (2001)
Electron--electron interactions in multibeam lithography columns
M. Mankos, A. Sagle, S. T. Coyle, and A. Fernandez
J. Vac. Sci. Technol. B 19, 2566 (2001)
Basic constraints for a multibeam lithography column
M. Mankos, S. Coyle, A. Fernandez, A. Sagle, W. Owens, J. Sullivan, and T.
H. P. Chang
J. Vac. Sci. Technol. B 19, 467 (2001)
Multisource optimization of a column for electron lithography
M. Mankos, S. Coyle, A. Fernandez, A. Sagle, P. Allen, W. Owens, J. Sullivan,
and T. H. P. Chang
J. Vac. Sci. Technol. B 18, 3010 (2000) PDF (558 kB)
System architecture choices for an advanced mask writer (100 to 130 nm)
Varoujan Chakarian et al.
Proc. SPIE Int. Soc. Opt. Eng. 3873, 228 (1999)
Design considerations for an electron-beam pattern generator for the 130-nm
generation of masks
Frank E. Abboud, Sergey V. Babin, Varoujan Chakarian, Abe Ghanbari,
Robert Innes, Frederick Raymond III, Allan L. Sagle, and Charles A. Sauer
Proc. SPIE Int. Soc. Opt. Eng. 3748, 385 (1999)
Low and medium energy physics experiments
Neutron-deuteron analyzing power measurements at 50 MeV. I. Backward
angles
J. L. Romero et al.
Phys. Rev. C 25, 2214 (1982)
Time reversal and charge symmetry studies in single nucleon transfer reactions
in the A = 5 system
A. L. Sagle, F. P. Brady, J. L. Romero, B. E. Bonner, N. S. P. King, M. W.
McNaughton, and H. E. Conzett
Phys. Rev. C 25, 1685 (1982)
Measurement of deuteron-deuteron elastic scattering at 5.75 GeV/c
Edgar T. Whipple, V. Perez-Mendez, A. L. Sagle, R. L. Talaga, F. Zarbakhsh,
J. B. Carroll, G. J. Igo, J. B. McClelland, M. Bleszynski, and K. Ganezer
Phys. Rev. Lett. 47, 774 (1981)
Correlations at small relative momenta among protons produced in collisions of
1.8 GeV/nucleon [sup 40]Ar with a KCl target
F. Zarbakhsh et al.
Phys. Rev. Lett. 46, 1268 (1981)
Search for quark effects in the d+[sup 4]He system
J. B. McClelland, J. B. Carroll, G. J. Igo, J. Oostens, F. Brochard, V. Perez-
Mendez, A. L. Sagle, R. Talaga, E. t. B. Whipple, and F. Zarbakhsh
Phys. Rev. Lett. 45, 1674 (1980)
Tensor analyzing power in pd backward scattering at GeV energies
G. Igo et al.
Phys. Rev. Lett. 43, 425 (1979)
p-[sup 4]He elastic scattering at 5.75 GeV/c
M. A. Nasser et al.
Phys. Rev. C 17, 1748 (1978)
p-[sup 4]He elastic scattering at 1.05 GeV
J. V. Geaga, M. M. Gazzaly, G. J. Igo, J. B. McClelland, M. A. Nasser, A. L.
Sagle, H. Spinka, J. B. Carroll, V. Perez-Mendez, and E. T. B. Whipple
Phys. Rev. Lett. 38, 1265 (1977)
Patents
1 6,724,002 Multiple electron beam lithography system with multiple beam modulated
laser illumination
2 6,326,635 Minimization of electron fogging in electron beam lithography
3 6,262,429 Raster shaped beam, electron beam exposure strategy using a two
dimensional multipixel flash field
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