Thin film processes (PVD, CVD), PVD pigments, Research/Engineer

Raj Pitchimani Ph.D.

**** * ********** ******, ***, Stillwater OK 74075

Phone: 610-***-**** (Res): 405-***-**** (mobile); e-mail ********@*****.***

OBJECTIVE:

To get a research/development engineer/scientist position

SUMMARY

Expertise in thin film research; Experience in PVD / CVD. Experience in PVD pigments by roll-to-roll. Expertise in thin film/nano particle/materials characterization using various surface analytical tools (AFM, STM, SEM, EDS, XPS, UPS, SIMS, TGA, TPD); Expertise in ion beam accelerator / Implanter; Experience in metal-semiconductor interfaces, passivated Si surfaces, single crystal, surfactant-mediated epitaxial structure, Knowledge of Japanese language (passed Level 3 of JLPT). Career motivated and adaptable, a self-starter; Perseverance, perfection, analytical and problem solving skills are added strengths.

PROCESS SKILLS

• Thin film deposition: PVD, CVD Spin coating, e-beam deposition, magnetron Sputter deposition and Thermal evaporation

• Surface/depth Characterization : XPS, XRD, UPS, SIMS, Light Emission Spectroscopy, EDS, FTIR

• Surface Imaging : STM, AFM, SEM

• Ion implant and ion beam analysis: Medium energy doping and materials modification

• Thermal analysis : Thermo Gravimetric Analysis (TGA), Temperature Programmed Desorption (TPD)

EQUIPMENT KNOWLEDGE

STM, AFM, SIMS, SEM, XPS, XRD, UPS, LEED, TGA, TPD, thin film deposition units, Roll-to-Roll deposition, Particle size analyzer (Malvern), Spectrophotometer (x-rite), Flacktek Speed Mixer, LABMAX, UHV and high vacuum pumps, Ion sources, RGA, leak detectors, temperature controllers & furnaces, Optical and IR pyrometers. Ion implanters medium energy (200-400 keV), thickness monitor, Monochromators

COMPUTER SKILLS

• Programming Languages /OS: Fortran, C, Unix

• Software: TRIM, Microsoft Office (Excel, Word, PowerPoint, Outlook), Sigmaplot

• HSPiP (Hanson Solubility Parameter), Minitab16, Matlab

PROFESSIONAL EXPERIENCE

Silberline Manufacturing Co. Inc, Tamaqua PA Research Scientist, July 2008- Oct. 2011)

• Developed and patented a functional PVD pigment starting from conceptualization to lab scale proof of concept to roll-to-roll pilot scale level.

• Patent application filed on another functional pigment (made through solid state reaction)

• Filed DOI (Disclosure of Invention) from Conceptualization to Lab scale proof of concept of color metallic effect pigment made by using magnetron sputter unit.

• Worked with technical staff to analyze/test the draw downs, paints of the pigments tested for weather stability of adhesion, color stability and functional performance in Weather-O-Meter

• Evaluated an already existing effect pigment for thermal stability and submitted the report

• Developed mica based effect pigment through wet chemistry inorganic process.

Dept. of Chemical Engineering, Texas Tech University, Lubbock, TX, USA (Postdoctoral Fellow: May 2005- July 2008)

• Used a combination of computational chemistry techniques and in-situ atomic force microscopy (AFM) experiments to control the coarsening of an energetic material (PETN).

• Improved the stability of PETN material by Zn doping.

• Studied the effect of moisture on the fibers of sanitary products using AFM and environmental SEM and a humidity chamber

• Determined the source of swelling of fibers and provided solutions to improve the contact between individual fibrils to make the fiber surface smooth.

Dept. of Chemistry, Oklahoma State University, Stillwater, OK, USA

(Postdoctoral Fellow: May 2001- April 2005)

• Used XPS, TPD, UPS, to study the adsorption and decomposition chemistry of cyanogens halides on Si surfaces (for making CN thin films that are technologically important for chemical sensors, molecular and optical electronics).

• Made molecular cyanogens thin films (CVD) on Si surface at low temperature

• Made stable CN films on Si surfaces from room temperature up to 470K.

• Used ion-bombardment induced light emission spectroscopy to study the adsorption of Silane (SiH4) and Germane (GeH4) on Si surfaces.

• These experimental conditions simulate the processes that occur in Plasma Enhanced Chemical Vapor Deposition (PE-CVD) of Si, a-SiH and SiO2 thin films.

• Produced micro-crystalline SiH on Si surface at low beam energy and low exposure of silane

• Transformed the micro-crystalline SiH into a-SiH thin films (that has applications in the solar cells) using high beam energy and higher exposure.

• Proved that under the exposure of germane, the formation of hydrides is less than on Ge surface than on Si surface.

Fundamental Electronics Research Institute, Osaka Electro-Communication University, Neyagawa, Osaka, Japan (Postdoctoral Fellow: May 1999-March 2001)

• Used temperature variable STM, studied the atomic level control of metallic nanostructures on passivated Si surfaces.

• Controlled the Cu nano-islands (by PVD) to form on the step edges, and domain boundaries of passivated Si (111) surface at about 345C.

• Identified the top of the Cu nano-islands to have body, centered cubic -phase Cu-Si alloy

EDUCATION/COURSES ATTENDED

• Ph. D. in Physics Saha Institute of Nuclear Physics, India

• M.S. in Physics, Madurai Kamaraj University, India

• B.S in Physics, G T N Arts College (Madurai Kamaraj University), India

PUBLICATIONS, PATENTS & AWARDS

Publications: research articles in journals – 38

Abstracts in national and international conferences-18

Awards/Fellowship: JSPS fellowship for postdoctoral Fellow

Languages skill: English, Japanese (passed Level 3 of JLPT)

Patents Applications Published / Applied: 2

REFERENCES: upon request

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