Yu-Ho Lin

**** ****** **.

Ann Arbor, MI

H 734-***-****

B adk2rz@r.postjobfree.com

Education

Sep.2019-

Apr.2021

University of Michigan-Ann Arbor, Ann Arbor, MI

{ Master of Science in Materials Science and Engineering

{ Relevant Coursework: Solid State Physics, Electronic and Optical Properties of Semiconductors, Electron Microscopy, Advanced Thermodynamics of Materials

{ GPA: 3.95/4.0

Sep.2018-

Jun.2019

National Tsing Hua University, Hsinchu, Taiwan

{ Non-degree Seeking Program - to obtain knowledge and skills for graduate school

{ Relevant Coursework: Scientific Computing, Introduction to Programming Design, Modern Physics Jan. 2018-

June 2018

KTH Royal Institute of Technology, Stockholm, Sweden

{ Exchange Program

Sep.2014-

June 2018

National Sun Yat-Sen University (NSYSU), Kaohsiung, Taiwan

{ Bachelor of Science in Chemistry

{ Academic Excellence Award, Fall 2017 - Placed Second among 60 students in class

{ Relevant Coursework: Electronics, Instrumental Analysis, Inorganic Chemistry Research and Work Experience

Aug. 2020-

Present

Hovden Research Group, University of Michigan

Master’s Student Researcher

{ Tested potential applications of transferable silicon nitride membranes to develop non-destructive and time-efficient way to prepare 2D material samples

July 2017-

Aug. 2017

Taiwan Semiconductor Manufacturing Company (TSMC)

Process Engineer Intern, Etching Department

{ Collaborated with ion implantation department to improve etching condition for 130nm, 90nm, and 40nm production processes

{ Tuned recipe to eliminated unwanted residues after etching and made the process more efficient and environmentally friendly

{ Placed first in the Intern Closing Competition

July 2016-

Oct. 2016

Semiconductor Nano Device and TFT Display Laboratory, NSYSU Summer Undergraduate Researcher

{ Studied performance of flexible thin-film transistors under different duration and intensity of mechanical and current stress

{ Analyzed mechanism for degradation after high-current stress and effect of buffer layer thickness

{ Measured electronic characteristics of transistors on probe stations and organized data Publications

B.W. Chen, [and 18 others, including Yu-Ho Lin] "Systematic Analysis of High-Current Effects in Flexible Polycrystalline-Silicon Transistors Fabricated on Polyimide," IEEE Transactions on Electron Devices, vol.64, no.8, Aug 2017

B.W. Chen, [and 15 others, including Yu-Ho Lin] "Effect of SiO2 Buffer Layer Thickness on Performance and Reliability of Flexible Polycrystalline Silicon TFTs Fabricated on Polyimide," IEEE Electron Device Letters, vol.37, no.12, Dec 2016

Skills

Electron Microscopy: SEM, TEM/STEM

Basics in MATLAB

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