David Sherwin **** Bridford Lake Circle, Apt. L
Greensboro, NC 27407
**********@*****.***
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Profile
~ IC Layout Designer~
"17 years of proven experience developing new products in the Semiconductor
Industry"
Solution-oriented, analytical professional with extensive experience
delivering high-quality assignments as a contributing project team member.
Outstanding problem-solving and decision-making skills with a reputation
for being able to conceptualize solutions to challenging situations and
implementing practical, quality project plans. Areas of expertise encompass
the following:
> Full Custom Digital, Analog, and Mixed Signal Layout Design including
artwork extraction and Wirelist Compare verification, DRC, and production
based backend checks
> Cell library development, microprocessor core, cache, pad ring, and
datapath designs, including unit level floorplanning
> Tool experience includes: Maestro, Tanner, GeneSys (in-house, similar to
Cadence), UE2, Cadence Virtuoso XL, Hercules, Calibre LVS / DRC, LVI, and
Hilex Wirelist Compare
> Daily chip wide DRC rollup for tapeout of EV7 Alpha processor
> Individual and Box Lead experience; mentored and directed junior mask
designers
> Wrote a comprehensive design rule document for MEMS process
~ Key Achievement~
> Served as an integral member of Design Team for EV7 64-bit processor used
in the Human Genome Decoding project which was completed more than a year
ahead of schedule
> Served on the Tukwila Design Team, the first Two Billion Transistor
Microprocessor
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Professional Experience
RF MICRO DEVICES, Greensboro, NC, June 2014 - Dec 2014
Mask Designer (Contract)
. Completed clean, electrically sound layout edits to existing wireless
switches and created full custom layout for new switches.
IC-ENABLE, Dallas, TX, July 2013 - Oct 2013
Mask Designer (Contract)
. Custom digital and analog layout design in Samsung .14 nm FinFet process
PIXTRONIX - Qualcomm Company, North Andover, MA, Apr 2012 - Aug 2012
MEMS Mask Designer (Contract)
. Demonstrated technical expertise while completing layout of digital
shutters for video displays and resolution test patterns for optics
testing
INTEGRATED DEVICE TECHNOLOGY, Duluth, GA, Sept 2011 - Feb 2012
Mask Designer (Contract)
. Developed complete custom analog and mixed signal layout of the Bandgap
and PII schematics in .40 nm TSMC process
QUALCOMM, INC, Raleigh, NC, 2007 - 2009
Mask Designer (Contract)
. Created complete custom layout of caches, register file, and datapath
schematics in Scorpion (core) / Raptor Processor in .45 nm technology
. Redesigned the core in and ultra-high performance process
INTEL COMPUTER CORPORATION (Microprocessor Design Center, Hudson, MA, 2003
- 2006
Senior Mask Designer - Itanium Design Group
. Successfully completed numerous projects from inception to completion,
including Itanium 64-bit processors in .90 nm and .65 nm
DIGITAL / COMPAQ, Shrewsbury, MA, 1997 - 2003
Senior Mask Designer / Mask Designer - Alpha Development Group
. Consistently met timelines while completing numerous projects, including
EV6 (.35 bulk CMOS), EV67 (.25 bulk CMOS), EV68a (aluminum .18 bulk CMOS
Samsung), EV7 (.18 bulk CMOS IBM), and EV79 (.13 bulk CMOS)
~ Prior Experience~
DIGITAL EQUIPMENT CORPORATION, Hudson, MA, Jun 1997 - Oct 1997
Mask Design Co-op
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Education
QUINSIGAMOND COMMUNITY COLLEGE, Worcester, MA, 1996 - 1997
. Electronics, Microprocessors, and Digital Logic
. Dean's List Both Semesters - Selected for Layout Co-op with Digital
Equipment Corporation
UNIVERSITY OF MASSACHUSETTS, Amherst, MA, 1989-1992
. History, English, and Psychology