Peggy J. McKay
Boulder Creek, CA *****
408-***-**** cell
831-***-**** home
Objective: Hands on role in process technology with emphasis in photolithography
process fabrication or new process development.
Highlights:
• Led successful high visibility photolithography cost reduction project at
TI/Silicon Systems
• Samsung Semiconductor employee of the year for development of
submicron gate photolithography process
• 6 years focus on submicron photolithography process development
• 20 years engineering and manufacturing experience with wide range of Si
and GaAs wafer process techniques including evaporator and sputter metal
deposition, chemical vapor deposition of dielectrics, wet etch, reactive ion
etch and through wafer via reactive ion etch
October 6, 2011 to Present
Engineering Technician – Thermo Fisher Scientific
Major responsibilities:
• Manufacturing and assembly of extremely intricate x ray tube components
in clean room environment.
• Glass blowing of tube envelopes, furnace operation, vacuum brazing, laser
and spot welding.
• SPC, sustaining of process, lean manufacturing methods.
• Assisting in R & D development of new design devices, process
documentation creation.
• Continuous Process Improvement Team
September 2007 to October 2011
Taliesin Handworks – Owner, designer textile arts and crafts
April 2002 to September 2003:
Zwerling Physical Therapy
Administrative assistant – medical services
June 1995 to March 1998
Texas Instruments – Sr. Staff Photolithography Engineer
Major responsibilities:
• Daily over site and sustaining of photolithography in class 10 clean room
• Created equipment analysis test plans for defect density study, implemented
regular qualification procedures, implemented auto equipment shut down
with SPC.
• Determined parameters for automated process recipe and tracking system
(PROMIS).
• Spear headed new chemical qualification and reduction of photo resist
usage resulting in major cost reduction for the company.
• Utilized SEM for detailed photoresist geometry sidewall height
measurements.
• Design test procedures for new equipment qualification and acceptance.
• Calibration of DNS coater developer system and Canon 10X i line and G
line steppers.
• Participate on 0.5 um BiCMOS process development team.
January 1982 to June 1995:
Samsung Electronics – (Harris Microwave) – Sr. Process Engineer
Major responsibilities:
• Sustaining and supervision of photolithography department of GaAs class
100 clean room.
• Scheduling of production.
• SEM inspection for analysis of process issues.
• Sustaining and operation of process equipment such as: Stepper, contact
alignment, Perkin & Elmer Sputter/thin films, e beam evaporators, plasma
etch. PECVD deposition, ion milling, RIE etch, wet etch, electrical test,
wafer thinning and scribe and break.
1975 to 1982
Watkins Johnson – Process Technician
Major responsibilities:
• Process and development of GaAs FET devices.
• Photolithography wet/dry etch, epi growth, thin film sputter.
Education:
• A.S. Electronics Technology – Cabrillo College
Proficient with Microsoft Word, Excel, Power Point
Extensive experience in clean room practices and protocol
References available upon request