Jeff Heater
**** ******** ***** ( Allen, Texas **002 ( H 972-***-**** ( C (972) 740-
**** ( ******@**.**.***
SUMMARY
A performance-driven Reliability, Process, Integration Electronics
Engineering Technician in the semiconductor industry with advanced
skills and experience in lab management, tester calibrations,
equipment maintenance, ESD lab compliance, lab supplies, vendor
interface, data collection, and documentation in compliance with ISO
9000, as well as Wafer fabrication development site to production site
metrology correlation across process disciplines, including thin
films, implant, diffusion, CMP, photolithography, and plasma etch. A
competent team member who successfully ensures compliance while
supporting organizational productivity.
TECHNICAL SKILLS
Test Systems: Auto prober, Keithley S600-DSR510, HP4062, Accretech
UF3000, Cascade S300 manual prober, Agilent IV tester, pulse
generator, expander, parameter analyzer 4156c, E5270, universal
counter, Tektronix O-scope, IMP analyzer, HP frequency counters,
QualiTau-MIRA, Infinity systems.
Wafer Fabrication: KLA SEM 8300, 8100XP, 8450; KLA Tencor F5; KLA 5200
alignment; Quantox/MCLT; Accent Scatterometry-CDS200; KLA Tencor
profilometer, Verity SEM-Applied Materials; KLA Surfscan; KLA Archer
AIM/20; Optiprobe-Thermawave Series 7 7431XP, 2600, 5240, 5340;
Metapulse (Rudolph) 300X; KLA spectra CD100; Keithley S4200. Nikon
G6/G7 steppers; TEL coats/developer; Hitachi S8800/S6000/S6180 SEM;
Plasmos SD4000 Prometrix; UV-1050/HP4284A mobile ion; HP4156A bench
probe; LAM research etcher. Applied Research P5000/8300; Lam
etch/Gasonics; Branson ash; Nanospec, Nanoline; Vickers. Nikon G6/G7
C&D bodies; SVG GCA, MTI, SSI Stepper workcell/batch develop;
PerkinElmer, Canon projection printers.
EXPERIENCE
TEXAS INSTRUMENTS, INC., Dallas, Texas
Reliability Engineering Technician (External Development Manufacturing)
2009-2013
. Held responsibility for lab management; coordinating tester
calibrations with Simco, Aetrium, QualiTau, and Cascade; preventative
maintenance repairs; out of tolerance responses; maintaining
equipment; ESD lab compliance; updating lab supplies; vendor
interface; and documenting all activities per lab QSM specs for
internal and external audit compliance for ISO 9000 prep.
. Assisted engineers with collecting (wireless 65, 45, and 28nm
technology for R&D) component and circuit reliability data for
advanced WLR CMOS transistor device stress; NBTI, TDDB, CHC, and
Electromigration testing; and Relxpert model data and packaging.
Transistor Characterization Engineering Technician (EDM) 2007-2009
. Performed detailed wafer-level current-voltage and capacitance-voltage
measurements for SPICE and reliability model development of CMOS
bipolar and drain-extended transistor, capacitor, and diode
components.
. Gained familiarity with use and maintenance of Cascade S300 semi-auto
prober, Agilent 4142/4145 semiconductor parametric analyzer, and
Agilent 4284 precision LCR meters. Used MACH software for data
collection.
Integration Engineering Technician 1999-2007
. Held responsibility for successful technology transfer of 120nm, 90nm,
and 65nm CMOS technology nodes, from development to high-volume
production in DMOS6.
. Held responsibility for development site to production site metrology
correlation across all process disciplines, including thin films,
implant, diffusion, CMP, photolithography, and plasma etch.
. Provided critical data metrology between send and receiving fabs;
audited/validated metrology parameters, recipes and target locations,
and Loop Integration process release.
. Coordinated silicon movement management across multiple fabs.
. Held responsibility for hand probe wafer-level reliability, including
TDDB, BTS, mobile ion, and NBTI measurements.
. Provided optical proximity correction validation support for
photo/plasma modules.
. Performed special process engineering/integration requests, including
SRAM CDs, contact, via, metal levels, and film thickness measurements.
ADDITIONAL EXPERIENCE
Process Integration Engineering Technician, 1992-1999. Held responsibility
for daily fab movement of 0.5 to 0.25 micron CMOS logic, dRAM and flash
eprom development lots in DMOS4, DP1/DMOS5, and disposition problem
material. Held responsibility for on-wafer characterization of photo and
etch CDs, plasma etch rates, film thicknesses, and mobile ion electrical
measurements. Performed complete photo focus exposure matrix testing for
process improvement and ran Engineering tests.
Plasma Process Engineering Technician, 1991-1992. Held responsibility for
disposition of problem lots in Plasma/Probe areas in DLOGIC. Performed
etch rates, gas/RF/pressure adjustments, and process improvements and ran
Engineering tests.
Photolithography/Wet Etch Process Engineering Technician, 1984-1991. Held
responsibility for disposition of problem lots in Photo/Wet Etch areas in
DLOGIC. Held responsibility for generating stepper files, creating
develop/coat recipes, creating SEM recipes, generating resist spin curves,
and evaluating new resists and FEM tests. Photolithography Operator, 1983-
1984. Operated PerkinElmer scanner. Electronics Technician, Lubbock,
Texas, 1983. Troubleshot and repaired TI-99/4A computer.
EDUCATION
NATIONAL INSTITUTE OF TECHNOLOGY, Livonia, Michigan
Degree in Electronic Engineering Technology, 1982
PROFESSIONAL DEVELOPMENT
Basic UNIX/LINUX
Electro Static Discharge Training
ISO 9000/Audit Team Member Ethics
Chemical Safety
Cleanroom Protocol
Excel, Word, PowerPoint Training
Plasma Etch
Semiconductor Device Physics
Chemistry, Photolithography
Metallization
Equipment Troubleshooting
CVD
Cycle Time Awareness
Basic Statistical Process Control
Discrete Components
AC/DC Circuits
Physical and Chemical Concepts
DUV Stepper-Basic Operation
Technical Knowledge Development Program Certified for Technicians