Title:Senior Process Engineer
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NAME: JOSEPH NUNN
ADDRESS:
CITY: Coppell
STATE/PROVINCE: TX
ZIP/POSTAL CODE: 75019
COUNTRY: USA
EMAIL: abpgkp@r.postjobfree.com
PHONE: 972-***-****
CANDIDATE ID: N/A
CITIZENSHIP: US
Citizen
EDUCATION: Not Entered
EXPERIENCE: Not Entered
WILL RELOCATE: Not Entered
RELOCATION INFO: Not Entered
JOB WANTED: Not Entered
HOMEPAGE:
HOTSKILLS:
ESUME
PASSOIRT_RESUME
JOSEPH H. NUNN
205 Jeb Court
Coppell, TX 75019
abpgkp@r.postjobfree.com
SUMMARY
I am a process engineer with extensive experience in semiconductor
front
ends and pilot lines. My expertise in the areas of diffusion and LPCVD
enables me to establish high reliability processes through detailed
characterizations of equipment and environment.
I am well versed in wet chemistry, diffusion, silicon and reclaim
wafers, and wafer qualification as it impacts product performance.
Furthermore, I directed the external and internal recycling of monitor
wafers to reduce costs for my company.
As a problem solver, I possess the ability to study conditions,
establish root causes, test hypotheses, and subsequently coordinate
engineering activities and reports. My interpersonal skills allow me
to
successfully lead projects and implement plans, in addition to
promoting
professional relationships. Finally, I am results-orientated, willing
to
put forth whatever effort is necessary to achieve problem resolution.
EXPERIENCE
HITACHI SEMICONDUCTOR AMERICA INCORPORATED
Las Colinas,
Texas
Senior Process Engineer, 1989 to 1998
Directed diffusion and anneal process setup, using 22 vertical
furnaces,
for 6" wafer processing. I oversaw a product range including MICON,
Static and Dynamic RAMS, with device geometry ranging from 1.2 to 0.5
microns. Conducted hands-on management of diffusion furnaces (6" and
8"), wet benches, wafer transfer systems, wafer inspection,
measurement
systems and back grind. I held responsibility for chemical and silicon
wafer vendor qualifications. Also, I worked with SPC and EDC for
process
control.
Diffusion Furnaces: I set up processes for wet and steam oxidationsand
characterized the systems. I establisheda "short-loop" product monitor
for determination of gate oxide integrity. I tested wet chemistry
cleaning procedures and the impact on product performance.
Monitor Cost Reduction: Reduction in the high cost of monitor wafers
was
achieved by internal and external monitor recycle procedures that I
established and qualified. This reduced the product to monitor ratio
from 0.83 to 0.40; the cost saving was $87K/mth.
Chemical Cost Reduction: I directed the qualification of domestic
supply
of chemicals to eliminate shipping and storage costs for material
imported from Japan. The qualifications included vendor audits, split
lot processing and reliability testing. The cost saving to my company
was $47K/mth.
Daily Work Activity: Each day I reviewed the status and performance of
equipment for the Diffusion area. I established plans for correction
of
problems and disposition of any problem lots. I established
engineering
data collection by process, product and machine: the data is reviewed
on
a weekly basis. Real time SPC was established on critical process
parameters.
HAMPSHIRE
INSTRUMENTSMarlborough, Massachusetts
Senior Engineer, 1987 to 1989
Developed low-stress metal deposition processes on silicon membranes.
Produced a metal film used as an X-ray absorber in photolithography
systems forsub-half micron geometry's.Oversaw Department of Navy
-sponsored development projects in a small company clean room and at
the
Materials Research Laboratory at MIT. In addition, managed equipment
selection, installation, and characterization.
Additional
Experience
INMOS CORPORATION, Colorado Springs, Colorado.Senior Engineer/ Section
Manager, 1980 to 1986. NCR CORPORATION, Colorado Springs, Colorado.
Engineering Manager, 1977 to 1980. HARRIS SEMICONDUCTOR, Melbourne,
Florida
.
Technical Staff Member, 1975 to 1977.
MICROSYSTEMS INTERNATIONAL, Ottawa, Ontario, Canada. Engineering
Section
Manager, 1969 to 1975. TEXAS INSTRUMENTS, Bedford, England.
Engineer/Senior Engineer
1960 to 1969
.
EDUCATION
OXFORD COLLEGE OF SCIENCE AND TECHNOLOGY,
Oxford,
England.
H.N.C., 1959, Inorganic and Physical Chemistry (equivalent to B.S.
Chemistry
)
PERSONAL
Married
. Three ChildrenTechnical Knowledge
Diffusion Processes and Equipment
Wet Benches and Cleaning Processes.
Atmospheric and Low Pressure Deposition Systems
Sputter Systems
Computer Skills
Microsoft Works
Excel
Data Collection and Analysis Programs
SPC Programs