Wojciech Worwag
Fremont, CA 94538 Cell: 505-***-****
Email: ********.******@*******.***
PROFESSIONAL PROFILE
> Recognized expert in wafer factory HVM plating operations
> Demonstrated significant technical leadership in emerging materials in
solar technology including:
o Conductive Adhesive for interconnects in solar modules;
o Chemistry of Diffusion Barrier paste for Emitter Wrap Through (EWT)
solar cells.
o EPI reinforcement and Lambertian coatings in thin film solar cells.
> Identified Saw Damage Etch (SDE) improvements to increase solar cell
efficiency
> Builds, leads and influences international teams toward development of
strategic materials in solar cell technology. Proven team building record
with European and Asian scientists and engineers. Innovative and
creative professional.
PROFESSIONAL EXPERIENCE
SENIOR DEVELOPMENT ENGINEER
10/2009 - Present
SOLEXEL, Inc.
Milpitas, CA
Joined Solexel Inc. a startup company, as a development engineer with
direct responsibilities in:
1. Reinforcement of Si very thin layers,
2. Reliability of cell and module components
3. Development of metallization solutions in solar cells
SENIOR DEVELOPMENT ENGINEER 09/2008 - 09/2009
Advent Solar, Inc.
Albuquerque NM
Joined Advent Solar, a startup company, as a development engineer with
direct responsibilities in:
1. Conductive Adhesive development in the Module Assembly,
2. Saw Damage Etch process ownership
3. Diffusion Barrier chemistry formulation and optimization.
. Led and directed European supplier and Advent Solar engineering in
conducting research on 20+ years of data on moisture importance
modulating Conductive Adhesive (CA) properties
. Drove CA development with major Japanese CA supplier. This resulted in
successful formulations of a price competitive and reliable new
interconnect material.
. Assumed ownership of SDE and PSG modules. Drove SDE development
through DOEs to improve Solar cell efficiency and line throughput.
. Identified main components of Diffusion Barrier paste, a critical
material in EWT solar cell technology, and initiated research to
prevent excursion in this process. Engaged a major Japanese supplier
for development.
MANAGER/ SENIOR MATERIALS ENGINEER January 2004 - August 2008
Intel Corporation
Chandler, Arizona
Transferred to Assembly Technology Development at Intel Corporation as
development engineer in STRL group. Promoted to Manager in result of
the achievements in Thru-Silicon-Via technology. Transferred to the
Materials Group at ATD in charge of supplier development and management
in USA and Asia.
. Led developments on electrochemical phenomenon in Carbon Nano-tubes
plating in applications for thermal solutions in CPU technology.
. Led Internal Heat Spreader development with domestic, Chinese and
Japanese suppliers. Enabled development of new thermal CPU solutions
in chip assembly.
. Project Leader for Optical Interconnects Development international
team (Israel-USA). This was a successful project in identifying high
speed alternative to copper interconnects.
. Led Thru-Silicon-Via successful development in sputtering and plating
operations. Achieved manufacturing readiness in Semitool plating
tools. Worked with and coached Japanese co-workers and suppliers.
SENIOR PROCESS ENGINEER May 2000 - December 2003
Intel Corporation
Hudson, Massachusetts
Joined Intel Corporation as a back-end process engineer with
responsibilities in C4 and Copper plating. Direct responsibilities for:
1. Process technology transfer and sustaining,
2. Test wafer regeneration,
3. Defect excursion prevention development.
. Key team member for new silicon factory startup and technology
transfer from Oregon PTD to F-17 Hudson, MA.
. Owned C4 and Cu plating operations, and excursion prevention
development.
. Focus on test wafer regeneration and cost reduction. This generated
over $3,000,000 savings per year.
. Champion of back-end defect reduction and defect metrology.
SENIOR ADVISORY ENGINEER
1992 - 2000
Seagate Technology Inc.
Bloomington, MN
. Formulated and implemented Pd-Ni plating solution in High Volume Wafer
manufacturing.
. Owned international Au plating process transfer from USA to Ireland.
. Responsible for plating process development in Magnetic Heads Wafer
factory.
. Managed thin film metrology: XRF/XRD Auger, FIB/SEM and TOF-SIMMS.
Process Control and Formulation Chemist
1988 - 1992
Epner Technology Inc.
Brooklyn, NY
. Formulated and implemented Gold and Nickel (EN) plating solutions.
. Responsible for control of plating process : Nickel, Gold Copper, Tin,
Tin-Lead
. Responsible for gold recovery operations
. Management of Waste Water Department
Education
Doctorate Degree in Chemical Engineering
Technical University of Wroclaw, Poland
Dissertation on kinetics of KNO3 in MSMPR mass crystallizer,
multidimensional Population Balance kinetics modeling.
Training & Relevant Coursework
Six Sigma Green Belt with Minitab training
DOE training with JMP
Oracle System and Database
Workstream, SAP, Microsoft Office
First Level Manager and Microinequities training
Project Management, Kepner-Tregoe training.
Technical Knowledge
American Electroplates and Surface Finishing Society certified instructor
Programming in FORTRAN, Turbo Pascal and C/C++.
Other Information
Languages: Fluent in English and Polish; passive Russian.
Open to relocation (US or global)