Alvin Sugerman
Semiconductor Device/ESD Engineer
Thornton Co. 80602
***-**-****
abl8c6@r.postjobfree.com
** **** *********** ************* ******/ESD Engineer seeking part time remote, via computer and
tele-communications, employment as ESD Semiconductor Engineer, 16 hours/week
Education
MA, Physics, 1966, Belfer Graduate School of Science, Yeshiva U., N.Y., N.Y., and most Ph.D. level
courses completed.
BS, Physics, 1964, Adelphi U., Garden City L.I., N.Y.
1997-6/2009, at Fairchild Semiconductor, South Portland Maine (Principal Engineer)
ESD process/device solutions were provide for 0.8um to 0.35um technologies. I have been a major
resource of information and thinking for the company on the subject of ESD and latch-up. My ESD and
Latch-up responsibilities include design of new devices, simulating them with CAD tools Suprem and
Medicci (d-c and pulsed), do sanity checks with back-of-the-envelope calculations, electrically bench test
them using HP4156, TLP and Pulse Generator, statistically analyze results using JMP and write summary
reports, provide planning for DOE Device/Circuit Test Patterns and supervise their layouts, write the ESD
and Latch-up rules in the Technology Specification and assist in coding these rules. I also consult with
my colleagues on ESD and latch-up in general. After the technologies pass progressive development
phases, I continue to act as consultant to circuit designers and process engineers responsible for and to
improve older technologies. My responsibilities have included supervising and teaching ESD and Latch-
up skills and concepts to new engineers.
Typically new technology processes require new ESD devices. Providing such devices necessitates an
in-depth knowledge of device physics in relation to the process . I have provided snap-back and non-
snap-back solutions when violation thereof can cause latch-up, R-C gate triggered low voltage isolated
ESD nmos wherein capacitively coupled gates provide the large drain current required to lower the
avalanche drain voltage, engineering of lightly doped drain/source implant to reduce series resistance and
increase emitter injection efficiency, cascoded ESD nmos and the cascoded scr for large current carrying
device capability and ESD nmos-diode for non-snap-back solutions. I introduced ESD implant at the drain
and source to lower trigger points by decreased channel lengths, higher emitter efficiency and higher
drain electric field, FET circuits to lower the voltage trigger point for ESD npn, and self protecting circuit
triggered LNDMOS drivers that stay within SOA. These accomplishments were done in cooperation with
my colleagues. Dialog with the designers and with the application engineers to more accurately define the
operational voltage windows for ESD. There were generic ESD solutions and solutions tailored to specific
circuit needs. When project requirements change mid-stream, I quickly adapt and provide timely
solutions.
Honors
Designated as a “Key Technologist”: 2001-2004
Presented papers at the Fairchild Technology Conferences in Hawaii “Similarities and Differences in
Analog and Logic ESD Solutions”, in Phoenix “ESD Snapback Solutions”
“Development of a Multi-Market 0.35 um Semiconductor Process Technology Family
2004 ASMC ” with S.Leibiger, et.al.
Author and co-Author of Patents:
“Internally Triggered Electrostatic Device Clamp with Stand-off Voltage”, patent# 6646840,
with M. Harley-Stead and R. Roberts
“ESD Protection for Semiconductor Products”, with Jun-Cai and S.Park, patent# 6873017
1993-1997, at National Semiconductor, South Portland Maine (Principal Engineer)
AlCu Deposition and Characterization using Varian M2000.
Responsible for bringing up sputter deposition tool, characterizing tool performance and thin film material
Co-author of external paper
28 years, 1966-1993, at IBM Hopewell Jct & Yorktown Watson Research Center, N.Y. (Senior Engineer)
Basic Semiconductor Device Engineering. Special device development: mathematical characterization of
vibrating semiconductor cantilever for sound/electrical conversion, mathematical optimization of photo
diodes, lateral npn improvements, statistical evaluation and tracking of resistors, Schottky diode formation
and evaluation for various process innovations (e.g.: RIE, thin oxide reduction, metal-metal reaction),
various metal deposition techniques with enhanced ion content.
Honors
Division award, 1988
Taught graduate level semiconductor physics classes at IBM for three semesters.
Guest Editor IBM Research and Development Journal: Topical on Schottky Barrier Diodes.
IBM mentor projects for PH.D. students at Stanford University and Rensselaer Polytechnical University.
Author, co-author and presenter of approximately 15 external papers.
Two IBM patents