Process Development
Resume:
Michael A. Todd
*** **** ***** ***** ? Phoenix, AZ 85021 ? 602-***-****
abl6pm@r.postjobfree.com
SUMMARY OF INTELLECTUAL PROPERTY EXPERIENCE
. Registered to practice law before the USPTO as a patent agent in
October 2009 (Registration Number 65340)
Patent Drafting / Technical Writing
. Twelve provisional patent applications drafted as an independent
inventor
. Assisted in the prosecution and drafting of ten original patent
applications as a sole proprietor and an employee of ASMI (Claim
Development, Review and Modification)
. Over forty invention disclosures related to chemistry, materials,
processes, devices and hardware drafted as an employee of ATMI,
Conexant Systems and ASMI
. Four funding grant proposals drafted as an employee of ATMI
. Sixteen technical publications drafted as a graduate researcher and
professional scientist
. Over fifty detailed technical reports related to chemistry,
materials, processes and hardware drafted as a professional
scientist throughout my career
Patent Prosecution Experience
. Review and analysis of Office Actions related to pending patent
applications
. Formulation and drafting of responses to Office Actions related to
pending patent applications
. Drafting responses to 35 U.S.C. 102 and 103 rejections
. Amendment of claims
Prior / Related Art Searching and Analysis - Due Diligence
. Chemistry, Materials, Processes, Devices, Apparatus and Hardware
EDUCATION and PROFESSIONAL AWARDS
* Ph.D. Chemistry, Arizona State University, August 1996
* B.S. Physics, Arizona State University, May 1991
* Shell Corporation Graduate Fellowship Award
* NATO ASI Award and International Conference Attendee
* Several FIRST Awards for outstanding job performance from Conexant
Systems
WORK EXPERIENCE AND SELECTED PROFESSIONAL ACHIEVEMENTS
Independent Contractor (Registered Patent Agent) present
. Due diligence / patentability assessments (related art searching)
for Todd Westersund of ASM America
. Prosecution of my own patent related to low temperature Selective
Epitaxial Growth (SEG)
. Prosecution assistance of pending patent applications for Judith
Shelling and related art searching (Symbus Law)
Innovative Process Technology, LLC Phoenix, AZ
2005 - 2008
Sole Proprietor
Formed the company and applied insight and experience to identify market
opportunities related to the semiconductor manufacturing industry. Invented
and prepared provisional patent applications for chemical precursors and
processes for the target markets, developed marketing materials and
presented them to prospective customers. Conducted patentability searches
and assisted in the preparation of regular patent applications.
ASM International Phoenix, AZ
2000 - 2005
Director, Chemical Technology
Member of Front End Senior Staff reporting to the Chief Operating Officer
of ASM International, Front End Operations. Management and oversight of
projects from conception to commercialization with responsibility for
budget development and oversight, process research, development,
qualification and documentation, product definition and marketing and
customer process demonstrations and documentation. Collaborated with
internal Department Managers to commercialize new technologies.
? Invented Silcore ; led the design and development of ASM
International's Silcore product
? Key contributor to the development and implementation of the
intellectual property protection strategy for Silcore
? Actively involved in invention disclosure and patent drafting
and patent application prosecution for
numerous patents related to Silcore and numerous materials and
processes
Innovative Precursor Technology, LLC Phoenix, AZ
1999 - 2000
Sole Proprietor
Formed the company and applied insight and experience to identify market
opportunities related to low-k dielectric materials and processes to
produce them. Invented and patented chemical precursors for the target
market, developed marketing materials related to them and presented them to
prospective customers.
? Negotiated licensing of patents
Rockwell Semiconductor / Conexant Systems Newport Beach, CA
1998 - 1999
Staff Process Development Engineer
Responsible for the introduction of internal low temperature epitaxial
processes to Rockwell Semiconductor / Conexant Systems. Central figure in
the selection of the process tool and the metrology tools related to
process development and monitoring. Directly accountable for process module
development, documentation and qualification. Collaborated with vendors and
fellow engineers to achieve an integrated process module suitable for high
volume device manufacturing.
Advanced Technology Materials Danbury, CT
1996 - 1998
Senior Research Chemist
Directly responsible for the design, synthesis, characterization and
testing of numerous antimony chemicals for ion implant and CVD
applications. Documented the results of research and development activities
to aid preparation of marketing materials and to communicate those results
broadly at technical conferences.
? Prepared funding grant proposals and invention disclosure documents
Appendix I: List of Awarded Patents (as an Inventor)
Patent Number Title
US 5, 606, 056 Carbon nitride and its synthesis
US 6, 001, 172 Apparatus and method for the in-situ generation of dopants
US 6, 005, 127 Antimony / Lewis base adducts for Sb-ion implantation and
formation of antimonide thin films
US 6, 146, 608 Stable hydride source compositions for manufacture of
semiconductor devices and structures
US 6, 319, 565 Stable hydride source compositions for manufacture of
semiconductor devices and structures
US 6, 767, 830 Br2SbCH3 a solid source ion implant and CVD precursor
US 6, 458, 718 Fluorine-containing materials and processes
US 6, 630, 413 CVD syntheses of silicon nitride materials
US 6, 716, 713 Dopant precursors and ion implantation processes
US 6, 716, 751 Dopant precursors and processes
US 6, 733, 830 Processes for depositing low dielectric constant materials
US 6, 743, 738 Dopant precursors and processes
US 6, 818, 570 Method of forming silicon-containing insulation film
having low dielectric constant and high mechanical strength
US 6, 821, 825 Process for deposition of semiconductor films
US 6, 825, 130 CVD of porous dielectric materials
US 6, 858, 196 Method and apparatus for chemical synthesis
US 6, 900, 115 Deposition over mixed substrates
US 6, 905, 981 Low-k dielectric materials and processes
US 6, 958, 253 Process for deposition of semiconductor films
US 6, 962, 859 Thin films and methods of making them
US 7, 005, 160 Methods of depositing polycrystalline films with
engineered grain structures
US 7, 026, 219 Integration of high k gate dielectrics
US 7, 029, 995 Methods for depositing amorphous materials and using them
as templates for epitaxial films by solid phase epitaxy
US 7, 144, 620 Process for depositing low dielectric constant materials
US 7, 186, 582 Process for deposition of semiconductor films
US 7, 186, 630 Deposition of amorphous silicon-containing films
US 7, 253, 084 Deposition from liquid sources
US 7, 273, 799 Deposition over mixed substrates
US 7, 285, 500 Thin films and methods of making them
US 7, 294, 582 Low temperature silicon compound deposition
US 7, 297, 641 Method to form ultra high quality silicon containing
compound layers
US 7, 425, 350 Apparatus, precursors and deposition methods for silicon-
containing materials
US 7, 544, 827 Process for depositing low dielectric constant materials
US 7, 547, 615 Deposition over mixed substrates using trisilane
US 7, 585, 752 Process for deposition of semiconductor films
Appendix II: List of Technical Publications (as an author)
"Novel synthetic routes to carbon-nitrogen films," J. Kouvetakis, A.
Bandari, M. Todd and B. Wilkens. Chem. Mat. 6(6), 811, 1994.
"Synthetic routes to carbon-nitride," M. Todd, J. Kouvetakis, T. Groy and
N. Cave. Chem. Mat. 7, 5103, 1995.
"Novel chemical routes to silicon-germanium-carbon materials," J.
Kouvetakis, M. Todd, D. Chandrasekhar and D.J. Smith. Appl. Phys. Lett.
65(23), 1994.
"Growth of heteroepitaxial Si1-x-yGexCy alloys using novel deposition
chemistry," M. Todd, P. Matsunaga, J. Kouvetakis, D. Chandrasekhar and D.J.
Smith. Appl. Phys. Lett. 67(9), 1, 1995.
"Influence of precursor chemistry on synthesis of silicon-carbon-germanium
alloys," M. Todd, J. Kouvetakis, P. Matsunaga, D. Chandrasekhar and D.J.
Smith. Mat. Res. Soc. Symp. Proc. 388, 322, 1995.
"Synthesis and characterization of heteroepitaxial diamond structured Ge1-
xCx alloys (x = 1.5 - 5.0 %) using chemical vapor deposition," M. Todd, J.
Kouvetakis and D.J. Smith. Appl. Phys. Lett. 68(17), 2407, 1996.
"Chemical synthesis of metastable germanium carbon alloys grown
heteroepitaxially on (100) Si," M. Todd, J. McMurran, D.J. Smith and J.
Kouvetakis. Chem. Mat. 8(10), 2491, 1996.
"Low temperature inorganic chemical vapor deposition of heteroepitaxial
GaN," J. McMurran, M. Todd, J. Kouvetakis and D.J. Smith. Appl. Phys. Lett.
69(2), 203, 1996.
"New silicon carbon materials incorporating Si4C building blocks," D.
Chandrasekhar, J. Kouvetakis, J. McMurran, M. Todd and D.J. Smith. Mat.
Res. Soc. Symp. Proc. 441, 723, 1997.
"Growth and characterization of highly concentrated Si1-xCx systems," D.
Chandrasekhar, D.J. Smith, J. Kouvetakis, J. McMurran and M. Todd. Appl.
Phys. Lett.
"Synthesis and stabilization of stibine for low temperature chemical vapor
deposition of carbon-free antimony films," M.A. Todd, G. Bandari and T.H.
Baum. Chem. Mat. 11(3), 547, 1999.
"Structural properties of heteroepitaxial germanium carbon alloys grown on
Si (100)," D.J. Smith, M. Todd, J. McMurran and J. Kouvetakis. Phil. Mag.
A, 81(6), 1613, 2001.
"Room temperature magnetoresistive response in CMR Perovskite manganite
thin films," M.A. Todd, Charles Seegel and T.H. Baum. Mat. Res. Soc. Symp.
Proc. (~Jan 1998).
"Novel antimony precursors for low temperature CVD of antimonide thin
films," M.A. Todd, G. Bandari and T.H. Baum. Mat. Res. Soc. Symp. Proc. (~
Jan 1998)
"Deposition of Si1-xGex films for gate electrode applications using a novel
approach," M. Todd, et al., ICSI3 The SiGe conference proceedings, Santa
Fe, NM March 2003.
"Low temperature, high growth rate epitaxial silicon and silicon germanium
alloy films," M. Todd and Keith D. Weeks. Appl. Surf. Sci. 224, 2004
(Proceedings from ISTDM 2003, Nagoya, Japan).
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