Mechanical Engineer Project Manager
Resume:
ALEXANDER KAGAN
San Jose, CA *5136
********@*****.***
FIELD: PRECISION MECHANICS and OPTICS, ELECTRO-OPTICAL
INSTRUMENTATION, METROLOGY, and QUALITY CONTROL
JOB EXPERIENCE:
2007 - Staff Mechanical Engineer (R&D) NEW-WAVE
Research a division of ESI, Fremont, CA
Designed, developed, and tested:
. Accuscribe 2Z Laser Scribing System:
Dark field LED illuminator with Debris Removal assembly,
Switchable Magnification Block (1x-10x) with Remote Control,
Safety Shutter (smart power consumption, fit back sensors),
Autofocus System
. For the Flat Panel Display production:
Parallelogram Shutter for color pixel repair (4x Galil controller,
DC motors with encoders),
QL200 - Advanced Beam Delivery System (ABDS), which enables
precise cuts on a
microscopic level for each of the three wavelengths (infrared,
green or ultraviolet)
1997-2007 Staff Mechanical Engineer (R&D) KLA-
TENCOR, San Jose, CA
Designed, developed, and tested:
. Puma (Patterned Wafer Inspection system): Fourier Filter (FF) and
Variable Aperture Diaphragm (VAD). FF with new 2 sides rods parking
design, which allows increase area of aperture coverage in smaller
mechanism envelope. VAD - new component for different pixel size
applications
. Quantox Product Wafer (PW) - PW head assembly: Electrostatic Gun and
Atomic Force Probe for deployment and measurement electrostatic
charge on product wafer. Developed new shaker, probe (cantilever)
holder, probe adjustable mount and gun with purge option
. SpectraFx100 (Thin Film Measurement System - Spectroscopic
Ellipsometer): methodology and fixtures to focus ellipsometer's
components and to align spectrometer's slit (190 DUV option);
Thermo Shield: reducing the SpectraFx 100 final alignment
time in half for manufacturing
and service. Developed Service Manual. Support beta
release at customer sites
. High Resolution Profiler (HRP): inline dual magnification microscope
(one objective and three channels: 2.5x and 25x optical
magnification, auto focus channel, two CCD outputs);
steps for assembly process; tools and fixtures for assembly and
alignment
. Grazing incidence interferometer (NanoPro): prototypes for new
measurement cell with adjustable reference mirrors, wafer holder,
calibration mirror, and accessory for calibration
. For bare wafers (NanoPro): flipper stage for grazing incidence
differential interferometer (vertical "gravity force free" wafer
measurement position; edge support, 1mm edge exclusion; tilt, piston
- remote alignment; topography of both sides of the wafer
simultaneous measurement)
. For pattern wafers: measurement module and calibration fixture for
stress measurement system (non-contact optical probe with two light
sources and CDD output)
Performed stress analysis for wafer, base Theta drive, base
HRP-240 and motion analysis for flipper stage
1995-1997 Sr. Mechanical Engineer (R&D) PHASE METRICS, Fremont, CA
Designed, developed, and tested for disk testers:
. New Generation Certifier: lifterless low -Z loader with X-Y piezo-
drivers submicron resolution for head-gimbal assembly (HGA)
. MG250A (Burnish/Glide/Certification System): lifterless low-Z loader
with virtual point of rotation for the (HGA) - received patent; quick
disconnect for HGA with magnetoresistive (MR) head; screwless Z-block
for HGA with suspension type 2
1992-1995 Project Manager (R&D) MICRO-METRIC, San Jose, CA
Designed, developed, tested, and calibrated:
. Barform Chip Alignment Station to manipulate and bond a read sensor
chip into a shoe (six-axis precise positioning stages with a common
rotational center for pitch, yaw, and roll; non-contact optical
sensors with position-sensitive detectors; computerized beam position
measurement and alignment system with New Focus piezo-drivers
submicron resolution and stability )
. Software for calibration Micro-Metric Computer Aided Microscope:
Three axis coordinate measuring system under control of software
package for thinfilm head and wafer product (precision mechanical
stages, position encoders, control and vision systems up to
200x200x100mm)
1988-1991 Project Lead (R&D) Leningrad Optical and Mechanical
Enterprise (LOMO)
Designed, developed, tested, and calibrated the following automatic
measuring systems:
. Microscope with Auto-focus for the quality Control of IC lithography
masks and wafers (for CD and FT measurements)
. Comparator for the calibration of the end gages with small measuring
force, and Statistical Process Control (up to 100 mm)
. Probe for Coordinate Measuring Machine (CMM)
Participated in design and development of the software for comparator,
microscope, and CMM.
PROGRAMMING LANGUAGES and APPLICATION: Excel, Auto CAD, Pro-E, SolidWorks,,
WinLens
EDUCATION:
MS in Optical Instrumentation and Spectroscopy: The Leningrad Institute of
Precise Mechanics and Optics.
Post-graduate coursework and research in Measurement of mechanical
parameters: The Research Institute of Metrology (Ph.D. program)
Thesis: Non-contact Optical Measurements lithography masks for IC and
standard rings.
Pro-E training San Jose, CA
Solid Design (HP) training San Jose, CA
AutoCAD training San Jose, CA
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