** ******* ***, ** ***** Cove Dr.,
Hempstead, NY, 11550, USA Seaford, NY, 11783, USA
E mail: **********@*****.*** Phone: 516-***-****
Phone : 516-***-**** E mail:
***************@*****.***
Mob. 330-***-****
.
HIGHLIGHTS OF QUALIFICATIONS
Doctor in Physics of Semiconductors and Dielectrics;
Extensive knowledge of various types of galvanic, electric and electronic components and
devices;
Work experience at research and production facilities with plant and staff supervisory
experience’s, head of process Development Department. ;
Extensive experience in research, electroforming process, microchips designs, LED, liquid
crystal color display and development of technological processes of semiconductors;
Extensive knowledge of technological processes in Optical Disc, MEMS, MOEMS, Solar,
TV, Nano and Holographic industries;
Extensive experience in state-of-the-art technologies, high-aspect ratio application,
achieving galvanic perfection in CD- and DVD-manufacturing;
Extensive knowledge of various types of vacuum equipment, spectrometers and vacuum
control systems;
Extensive experience in research, optimization and development thin films application
including technologies of resistive evaporation, electronic beam, magnetron and plasma
processes;
Work experience at research and production facilities with plant and staff supervisory
experience’s, head of process Development Department. ;
Over 60 scientific publications and patents in the area of development of equipment, methods,
and techniques processes of vacuum application, electroforming, electroless of metal, alloys
and dielectrical films;
A number of registered patents for inventions and innovative ideas.
WORK EXPERIENCE
Doctor, Head of Process Development
Department
August 2005 to present
Digital Matrix,
New York, New York, USA
Heading Research Lab developing and perfecting the
Electroforming processes used in Optical Disc,
MEMS, MOEMS, NANO, Solar, TV, LED
Semiconductor and Holographic industries;
Personal training, courses to teach - analytical control
solutions;
-
Sp e c tro p h o t o m e t e r s a n d c h e mic al
c o n trol le m e n t s;
-
Prop er tie s of m e t al a p plic a tion co n trol;
Doctor, Senior Process Engineer Digital Matrix,
October 2000 to August 2005 New York, New York, USA
Heading Research Lab developing and perfecting the
electroforming processes used in Optical Disc,
MEMS, MOEMS, NANO, Solar, TV, LED,
Semiconductor and Holographic industries;
Personnel Training;
Developing new technological processes for forming
structures and removing SU-8 photoresist in MEMS,
MOEMS, and NANO production;
Developing new electroplating processes for
manufacturing of high- quality stampers in CD,
DVD and LED production;
Performing testing, installation and maintenance of
state-of-the-art equipment designed and
manufactured by Digital Matrix;
Performing optimization and chemical analysis of
solutions;
Providing technical guidance to customers during
installation of new equipment;
Performing optimization of physical parameters of
metal applications, including stress, hardness,
roughness, thickness, and profiles;
Computer Engineer, Legend Micro Inc., Akron, Ohio, USA
August 1999 to September 2000
Developed computer systems and network integration
Doctor, Chief Specialist
Head of Laboratory
October 1996 to May 1999 Scientific Research Institute of Molecular Electronics
Nord Group Inc., Moscow, Russia
Personal training, courses to teach:
-Vacuum Equipments and Technological Processes
in Semiconductors;
-Thin Films applications for microchips;
Supervised and optimized the technological process
:
of magnetron application of metal films in
production of compact disks;
Supervised the technological process of production
of compact disks;
Performed turn-key installation, tune-up,
maintenance, and optimized the CD-production line
and matrixes;
Supervised the repair and maintenance staff;
Doctor, Lead Engineer,
Head of Laboratory
May 1974 to October 1996 Scientific Research Institute of Molecular Electronics
and Plant Micron, Moscow, Russia.
Teach courses: - Physics of Semiconductors and
Dielectrics,
-Vacuum Equipments and Technological Processes
in Semiconductors;
-Thin Films applications for microchips;
- Solar Elements;
Headed Research Lab developing and perfected metal
application processes used in Optical Disc, MEMS,
MOEMS, NANO, Solar,
Semiconductor and Holographic industries;
Performed and coordinated microelectronic structure
research of Shottki diodes and memory circuits and
engineering of vacuum equipment for resistive
(electronic beam) and magnetron application;
Performed and coordinated research of production of
texturized and monocrystal films of nickel,
chromium, and copper by vacuum application and
electroforming processes;
Performed and coordinated research and engineering
of vacuum equipment for resistive (electronic beam)
and magnetron application of metal films with
computerized control of speed and thickness of
application and mass spectrographic control of the
gas media;
Developed and put into production vacuum
equipment for magnetron application of metal films
for use in production of integrated circuits;
Developed and optimized new technologies of
magnetron applications of films of high consistency
in material quality and thickness,
particularly super pure aluminum, nickel, tungsten,
titanium, and platinum;
Performed and coordinated research of variations of
vacuum conditions of oil and oil-free pumping in
production of integrated circuits;
Supervised the research laboratory and coordinated
multiple projects
EDUCATION
Ph.D. in Physics Bauman Moscow State Technical University
of Semiconductors and Dielectrics, Radio Technology University of Ryazan,
1983-1987 Moscow, Ryazan, Russia
Assistant Professor
1976-1983
M.S. in Electronic Technologies, Bauman Moscow State Technical University
1974-1976 Moscow, Russia
Junior Scientific Researcher, National Research Tomsk Polytechnic University
( Kirov Tomsk
Polytechnic University)
Assistant Professor Tomsk, Russia
1970 -1974
B.S. in Physics of Metals,
Metallurgy, Equipment and National Research Tomsk Polytechnic University
( Kirov Tomsk
Polytechnic University)
Technology of Thermal Processing Tomsk, Russia
of Metals,
1965 to 1970
OTHER SKILLS AND INTERESTS
Implementation, troubleshooting, start up and repair of
complex electronic equipment designed by Digital
Matrix for various world wide leaders in electronic radio
and TV communication industry including Sony,
Panasonic, Samsung, Pioneer, LG, GE and personnel
training;
Fluent in Russian, working knowledge of Ukrainian and
Uzbek;
Proficient in various computer programs; Internet and
related applications;
Extensive World travel experience;
Extensive experience with international customs and
culture
References, publication and patent titles are available upon request
Sample Publications: ( to be edited….)
Development and optimization technological process and fabrication of NANO structures,
MEMS devices and
Semiconductors
The theory Pulse Reversal and Direct Current Plating
Development VIA applications and NANO structures for Meningitis Biosensors
Research in Effectiveness of Microfilm Applications
Issues in Construction and Use of Equipment for Continuous Microfilm Application
Aluminum-Silicon Contact Applications
The properties of a-SiGeH films deposited by high speed PECVD
Mass-spectrometer Research of Gaseous Medium in Magnetron Applications
Structure of Deformed Alloys
Microelectronic Research of Semiconductor Structures
Properties of Aluminum Alloys
The optoelectronic properties and microstructure of a-SiGeH films deposited by 50 KHz
-13.56MHz PECVD
Effect of Material Grade and Copper Additions on Corrosion Stability of Aluminum Films
Vacuum Grade and Aluminum Evaporation Purity in Microfilm Production
Effect of Gas Medium Composition on Vacuum-produced Films and Their Physical Properties
and Quality
Applications of Super Pure Aluminum
Time Relaxation of Aluminum-Silicon Surfaces in Semiconductors
Issues in Electric Properties of Memory Circuits
Active Structures of Amorphous Semiconductors
Electric Conductivity and Stability of Switches Based on Amorphous Semiconductors
Effect of Forming Regime of Amorphous Semiconductors on Electric and Physical Properties of
Structures
Silicon Structuring in Magnetron Applications
Possibilities of Thermal Stabilization of Switches
Developing new technological processes for forming structures and
removing SU-8 photoresist in MEMS, MOEMS, and NANO
production
Developing new electroplating processes for manufacturing of high-
quality stampers in CD and DVD production.
Method of Data Control the Ionization Energy of Deep Level Centers Semiconductors
QC Control of SiO2 Etching process lithography Integrated Circuit by Dew-Point Method
and Device for Technological Process .
Method Fabrication of Active Transistors Matrix and the technological process deposition
of Amorphous SiC:H for the Color Liquid Cristal Display (LCD).
The Method of Manufactory Hf-Si Shottky Diodes and device for realization process
application.