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Engineer Process

Location:
Bellmore, NY, 11710
Posted:
June 20, 2013

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Resume:

** ******* ***, ** ***** Cove Dr.,

Hempstead, NY, 11550, USA Seaford, NY, 11783, USA

E mail: **********@*****.*** Phone: 516-***-****

Phone : 516-***-**** E mail:

***************@*****.***

Mob. 330-***-****

.

HIGHLIGHTS OF QUALIFICATIONS

Doctor in Physics of Semiconductors and Dielectrics;

Extensive knowledge of various types of galvanic, electric and electronic components and

devices;

Work experience at research and production facilities with plant and staff supervisory

experience’s, head of process Development Department. ;

Extensive experience in research, electroforming process, microchips designs, LED, liquid

crystal color display and development of technological processes of semiconductors;

Extensive knowledge of technological processes in Optical Disc, MEMS, MOEMS, Solar,

TV, Nano and Holographic industries;

Extensive experience in state-of-the-art technologies, high-aspect ratio application,

achieving galvanic perfection in CD- and DVD-manufacturing;

Extensive knowledge of various types of vacuum equipment, spectrometers and vacuum

control systems;

Extensive experience in research, optimization and development thin films application

including technologies of resistive evaporation, electronic beam, magnetron and plasma

processes;

Work experience at research and production facilities with plant and staff supervisory

experience’s, head of process Development Department. ;

Over 60 scientific publications and patents in the area of development of equipment, methods,

and techniques processes of vacuum application, electroforming, electroless of metal, alloys

and dielectrical films;

A number of registered patents for inventions and innovative ideas.

WORK EXPERIENCE

Doctor, Head of Process Development

Department

August 2005 to present

Digital Matrix,

New York, New York, USA

Heading Research Lab developing and perfecting the

Electroforming processes used in Optical Disc,

MEMS, MOEMS, NANO, Solar, TV, LED

Semiconductor and Holographic industries;

Personal training, courses to teach - analytical control

solutions;

-

Sp e c tro p h o t o m e t e r s a n d c h e mic al

c o n trol le m e n t s;

-

Prop er tie s of m e t al a p plic a tion co n trol;

Doctor, Senior Process Engineer Digital Matrix,

October 2000 to August 2005 New York, New York, USA

Heading Research Lab developing and perfecting the

electroforming processes used in Optical Disc,

MEMS, MOEMS, NANO, Solar, TV, LED,

Semiconductor and Holographic industries;

Personnel Training;

Developing new technological processes for forming

structures and removing SU-8 photoresist in MEMS,

MOEMS, and NANO production;

Developing new electroplating processes for

manufacturing of high- quality stampers in CD,

DVD and LED production;

Performing testing, installation and maintenance of

state-of-the-art equipment designed and

manufactured by Digital Matrix;

Performing optimization and chemical analysis of

solutions;

Providing technical guidance to customers during

installation of new equipment;

Performing optimization of physical parameters of

metal applications, including stress, hardness,

roughness, thickness, and profiles;

Computer Engineer, Legend Micro Inc., Akron, Ohio, USA

August 1999 to September 2000

Developed computer systems and network integration

Doctor, Chief Specialist

Head of Laboratory

October 1996 to May 1999 Scientific Research Institute of Molecular Electronics

Nord Group Inc., Moscow, Russia

Personal training, courses to teach:

-Vacuum Equipments and Technological Processes

in Semiconductors;

-Thin Films applications for microchips;

Supervised and optimized the technological process

:

of magnetron application of metal films in

production of compact disks;

Supervised the technological process of production

of compact disks;

Performed turn-key installation, tune-up,

maintenance, and optimized the CD-production line

and matrixes;

Supervised the repair and maintenance staff;

Doctor, Lead Engineer,

Head of Laboratory

May 1974 to October 1996 Scientific Research Institute of Molecular Electronics

and Plant Micron, Moscow, Russia.

Teach courses: - Physics of Semiconductors and

Dielectrics,

-Vacuum Equipments and Technological Processes

in Semiconductors;

-Thin Films applications for microchips;

- Solar Elements;

Headed Research Lab developing and perfected metal

application processes used in Optical Disc, MEMS,

MOEMS, NANO, Solar,

Semiconductor and Holographic industries;

Performed and coordinated microelectronic structure

research of Shottki diodes and memory circuits and

engineering of vacuum equipment for resistive

(electronic beam) and magnetron application;

Performed and coordinated research of production of

texturized and monocrystal films of nickel,

chromium, and copper by vacuum application and

electroforming processes;

Performed and coordinated research and engineering

of vacuum equipment for resistive (electronic beam)

and magnetron application of metal films with

computerized control of speed and thickness of

application and mass spectrographic control of the

gas media;

Developed and put into production vacuum

equipment for magnetron application of metal films

for use in production of integrated circuits;

Developed and optimized new technologies of

magnetron applications of films of high consistency

in material quality and thickness,

particularly super pure aluminum, nickel, tungsten,

titanium, and platinum;

Performed and coordinated research of variations of

vacuum conditions of oil and oil-free pumping in

production of integrated circuits;

Supervised the research laboratory and coordinated

multiple projects

EDUCATION

Ph.D. in Physics Bauman Moscow State Technical University

of Semiconductors and Dielectrics, Radio Technology University of Ryazan,

1983-1987 Moscow, Ryazan, Russia

Assistant Professor

1976-1983

M.S. in Electronic Technologies, Bauman Moscow State Technical University

1974-1976 Moscow, Russia

Junior Scientific Researcher, National Research Tomsk Polytechnic University

( Kirov Tomsk

Polytechnic University)

Assistant Professor Tomsk, Russia

1970 -1974

B.S. in Physics of Metals,

Metallurgy, Equipment and National Research Tomsk Polytechnic University

( Kirov Tomsk

Polytechnic University)

Technology of Thermal Processing Tomsk, Russia

of Metals,

1965 to 1970

OTHER SKILLS AND INTERESTS

Implementation, troubleshooting, start up and repair of

complex electronic equipment designed by Digital

Matrix for various world wide leaders in electronic radio

and TV communication industry including Sony,

Panasonic, Samsung, Pioneer, LG, GE and personnel

training;

Fluent in Russian, working knowledge of Ukrainian and

Uzbek;

Proficient in various computer programs; Internet and

related applications;

Extensive World travel experience;

Extensive experience with international customs and

culture

References, publication and patent titles are available upon request

Sample Publications: ( to be edited….)

Development and optimization technological process and fabrication of NANO structures,

MEMS devices and

Semiconductors

The theory Pulse Reversal and Direct Current Plating

Development VIA applications and NANO structures for Meningitis Biosensors

Research in Effectiveness of Microfilm Applications

Issues in Construction and Use of Equipment for Continuous Microfilm Application

Aluminum-Silicon Contact Applications

The properties of a-SiGeH films deposited by high speed PECVD

Mass-spectrometer Research of Gaseous Medium in Magnetron Applications

Structure of Deformed Alloys

Microelectronic Research of Semiconductor Structures

Properties of Aluminum Alloys

The optoelectronic properties and microstructure of a-SiGeH films deposited by 50 KHz

-13.56MHz PECVD

Effect of Material Grade and Copper Additions on Corrosion Stability of Aluminum Films

Vacuum Grade and Aluminum Evaporation Purity in Microfilm Production

Effect of Gas Medium Composition on Vacuum-produced Films and Their Physical Properties

and Quality

Applications of Super Pure Aluminum

Time Relaxation of Aluminum-Silicon Surfaces in Semiconductors

Issues in Electric Properties of Memory Circuits

Active Structures of Amorphous Semiconductors

Electric Conductivity and Stability of Switches Based on Amorphous Semiconductors

Effect of Forming Regime of Amorphous Semiconductors on Electric and Physical Properties of

Structures

Silicon Structuring in Magnetron Applications

Possibilities of Thermal Stabilization of Switches

Developing new technological processes for forming structures and

removing SU-8 photoresist in MEMS, MOEMS, and NANO

production

Developing new electroplating processes for manufacturing of high-

quality stampers in CD and DVD production.

Method of Data Control the Ionization Energy of Deep Level Centers Semiconductors

QC Control of SiO2 Etching process lithography Integrated Circuit by Dew-Point Method

and Device for Technological Process .

Method Fabrication of Active Transistors Matrix and the technological process deposition

of Amorphous SiC:H for the Color Liquid Cristal Display (LCD).

The Method of Manufactory Hf-Si Shottky Diodes and device for realization process

application.



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