DONALD O. ARUGU, Ph.D.
Austin, TX 78749
Mobile: 972-***-****
E-mail:
******.*****@***.***
SUMMARY
Resourceful, pragmatic Yield Enhancement Engineer with key experience in
semiconductor manufacturing, development, and applications. Author of
technical publications, inventor, and skilled Auger spectroscopist. Defects
reduction and process yield improvement champion. Transferable expertise
includes:
SEM/EDX Analysis Photolithography Interconnect
Technology
Process Integration Yield Enhancement Optical Wafer
Inspection
PROFESSIONAL EXPERIENCE
Micron Technology, Manassas, VA
RDA Module Engineer 2011-
2012
. Employed real time defects analysis (rda) to drive yield improvement
activities for manufacturing memory chips at the contact module.
Performed defect to yield loss correlation using probe bin fails to
develop reaction mechanisms for OOC processes.
. Evaluated and qualified CMP slurries from alternative U.S. suppliers
following near supply disruption from Japan post 2011 earthquake.
TEXAS INSTRUMENTS, INC. Dallas, TX
Process/Yield Engineer 2004 -
2009
Led successful teams to resolve defect problems and improve yield
. Identified and resolved furnace vibration induced clustered defects at
Poly Silicon deposition resulting in 2% yield improvement.
. Resolved multiple Carbon and Stainless steel defect sources at Digital
Mirror (DLP) Assembly and Test production facility resulting in 5% yield
improvement.
. Identified and resolved Aluminum (AlOS) particulate defect issues at T4
test by implementing cleaning and handling procedures for linear carriers
in DLP Window loop.
MOTOROLA INC. Austin, TX
Yield Engineer 2000 - 2003
. Reduced metal pattern defects by 70% by implementing a post Aluminum
deposition scrub process resulting in 10% yield improvement.
. Achieved 50% reduction in FEOL trench cone defects by implementing a pre-
Argon etch process
. Implemented a scrub chemistry that eliminated post CMP defect residues at
local interconnect and contact levels on aluminum and copper
technologies.
. Co-invented a void free metal fill process for contacts and vias of any
aspect ratio.
DONALD O. ARUGU, Ph.D.
KLA-TENCOR INSTRUMENTS CORP., Austin TX
Sr. Applications Engineer
1996 - 2000
. Trained customers to proficiency on methods of defect detection using KLA-
Tencor Defect Inspection platforms (KLA21XX, KLA255X)
. Developed and supported customer acceptance tests procedures for tool
matching, beta testing, and head-to-head product evaluation.
. Implemented advanced recipe management (SAT, Mean/Range, ADC) and
strategies for managing wafer inspection capacity/costs at 3 customer
sites. Work generated a repeat order for $2M wafer inspection equipment.
. Provided feedback on competitive business opportunities to accounts sales
manager.
SEMATECH INC. Austin, TX
Process Integration Engineer
1992 - 1996
. Led process integration team that developed 0.25 um CMOS process enabling
the certification of all process development tools at this technology
node.
. Developed and supported custom process flows for member companies'
silicon needs to exercise process development equipment at 0.25um, and
0.35um design rules.
. Eliminated causes of particulate defects in Rainbow etcher by
implementing a preventive maintenance procedure that periodically
replaced quad seals on the load locks. Received the Etch Division
Recognition Award for Excellence for this effort.
. Evaluated the performance of organic anti-reflective coatings on silicon,
nitride, and SiO2 substrates, for effectiveness and compatibility with
chemically amplified DUV photoresists. Work resulted in the adoption of
Apex-E as a positive DUV photoresist.
ADDITIONAL RELEVANT EXPERIENCE
Material Science Research Center of Excellence, Washington DC
Resident Auger Spectrocopist
. Performed surface analysis and characterization of semiconductor films
(SiC, GaAs, AlGaAs, InGaAs, SiN, and TiN) using Auger Spectroscopy, to
support research efforts to develop novel high temperature semiconductor
materials, and fast switching low band gap devices.
. Invented a process for etching geometric frames of 5-micron thick SiC
films on silicon substrate. This invention enabled the discovery of the
unique property of birefringence in SiC crystals.
. Developed a composite metal contact for SiC with lowest recorded specific
resistance, enabling advances in the building of SiC devices.
EDUCATION
. Ph.D. Electrical Engineering, Howard University, Washington DC
. MSChE, BSChE, Chemical Engineering, Howard University, Washington DC
INVENTIONS / PUBLICATIONS
. Method of forming an arc layer for a semiconductor device (US Patent
006908852B2)
. Metal fill process for Semiconductor Device (Patent pending, filed
September 2002)
. TI-64324 "Linear carrier storage and transport rack" - Patent disclosure
submitted 3/30/07
. Effects of anneal temperature on the electrical characteristics of nickel
based ohmic contacts to beta-SiC, Electron. Lett 31 (8), 678-680 (1995)
. 0.35 - micron excimer DUV photolithography process, SPIE Vol. 127
Optical/Laser Microlithography VI, 287, 1993.